Molybdenum Sputtering Target (Mo)

The S4R Molybdenum Sputtering Target is manufactured from high-purity molybdenum metal for physical vapor deposition and magnetron sputtering applications.

Molybdenum is a refractory metal characterized by a very high melting point, good thermal stability, low thermal expansion and good electrical conductivity. It is widely used for the deposition of conductive, diffusion-barrier, electrode and functional thin films in semiconductor, display, photovoltaic, electronic and materials-science research.

The target is available in two standard laboratory formats with a nominal purity of 99.95% (3N5):

Ø50.8 × 3 mm
Ø76.2 × 3 mm

Other dimensions, thicknesses, purity grades and backing-plate configurations may be available upon request.

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Target Size
- Ø50.8 × 3 mm (2 in.)
- Ø76.2 × 3 mm (3 in.) + 18.00 €

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Specification
Product Name	Molybdenum Sputtering Target
Material	Molybdenum
Chemical Symbol	Mo
CAS Number	7439-98-7
Purity	99.95% (3N5)
Shape	Circular Disc
Standard Size 1	Ø50.8 × 3 mm
Standard Size 2	Ø76.2 × 3 mm
Imperial Equivalents	2 in. or 3 in. diameter
Quantity	1 Target
Appearance	Metallic, Silvery-Grey
Odor	Odorless
Atomic Number	42
Atomic Weight	95.95 g/mol
Theoretical Density	Approximately 10.28 g/cm³
Melting Point	Approximately 2,623 °C
Thermal Conductivity	Approximately 138 W·m⁻¹·K⁻¹
Coefficient of Thermal Expansion	Approximately 4.8 × 10⁻⁶ K⁻¹
Magnetic Behavior	Non-Ferromagnetic
Recommended Sputtering Mode	DC Magnetron Sputtering
Standard Configuration	Unbonded Solid Target
Bonding Options	Available Upon Request

Molybdenum Sputtering Target (Mo)

0.00 € 0.0 EUR 0.00 €

Pricing available to approved customers

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