Molybdenum Sputtering Target (Mo)
The S4R Molybdenum Sputtering Target is manufactured from high-purity molybdenum metal for physical vapor deposition and magnetron sputtering applications.
Molybdenum is a refractory metal characterized by a very high melting point, good thermal stability, low thermal expansion and good electrical conductivity. It is widely used for the deposition of conductive, diffusion-barrier, electrode and functional thin films in semiconductor, display, photovoltaic, electronic and materials-science research.
The target is available in two standard laboratory formats with a nominal purity of 99.95% (3N5):
- Ø50.8 × 3 mm
- Ø76.2 × 3 mm
Other dimensions, thicknesses, purity grades and backing-plate configurations may be available upon request.
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