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Magnesium Oxide Sputtering Target (MgO)

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The S4R Magnesium Oxide Sputtering Target (MgO) is manufactured from 99.99% (4N) magnesium oxide ceramic for physical vapor deposition (PVD) and RF magnetron sputtering applications.

Magnesium oxide is a wide-bandgap electrically insulating oxide valued for its high thermal stability, chemical stability and dielectric properties. MgO sputtering targets are suitable for the deposition of dielectric and insulating films, buffer and barrier layers, magnetic tunnel-junction barrier layers, resistive-switching structures and advanced thin-film research.

Standard S4R targets are supplied as circular discs in 2-inch and 3-inch diameters with a nominal thickness of 3 mm. Alternative dimensions, thicknesses and bonded configurations are available upon request.

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Sputtering and Compatibility

Magnesium oxide is an electrically insulating oxide ceramic. RF magnetron sputtering is therefore the recommended standard deposition method for direct sputtering from an MgO target.

Actual deposition conditions depend on the sputtering-source design, RF generator and matching network, applied RF power and power density, working pressure, process-gas composition, target-to-substrate distance, substrate material and temperature, target cooling and required film properties.

S4R does not specify universal RF power, working pressure, substrate temperature or deposition rate. These parameters must be established according to the sputtering system, target dimensions and required film characteristics.

The stoichiometry, density, crystallinity, dielectric properties and microstructure of deposited MgO films may vary with process conditions, oxygen partial pressure, substrate temperature and post-deposition treatment.

Because MgO ceramic targets are brittle and sensitive to thermal gradients, appropriate cooling, uniform thermal contact and progressive power conditioning are recommended during operation.

Bonding services, backing plates, alternative thicknesses and custom target dimensions are available upon request.

Specification
Product Name Magnesium Oxide Sputtering Target
Material Magnesium Oxide
Chemical Formula MgO
CAS Number 1309-48-4
Purity 99.99% (4N)
Material Type Oxide Ceramic
Electrical Character Electrical Insulator / Dielectric
Calculated Molar Mass Approximately 40.30 g/mol
Typical Applications Dielectric Films, Insulating Layers, Buffer Layers, Magnetic Tunnel-Junction Barriers, Resistive-Switching Structures and Thin-Film Research
Shape Circular Disc
Standard Target Diameters Ø50.8 mm (2 in.), Ø76.2 mm (3 in.)
Standard Target Thickness 3 mm
Standard Target Sizes Ø50.8 × 3 mm (2 in.), Ø76.2 × 3 mm (3 in.)
Appearance White to Off-White Ceramic; Appearance May Vary by Batch
Recommended Sputtering Mode RF Magnetron Sputtering
Alternative Thicknesses Available Upon Request
Bonded Configuration Available Upon Request
Custom Dimensions Available Upon Request

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