Indium Tin Oxide Sputtering Target (ITO)
The S4R Indium Tin Oxide Sputtering Target (ITO) is manufactured from 99.99% (4N) indium tin oxide ceramic with a nominal composition of 90 wt% In₂O₃ and 10 wt% SnO₂ for physical vapor deposition (PVD) and magnetron sputtering applications.
Indium tin oxide is a widely used transparent conductive oxide combining high electrical conductivity with high optical transparency in the visible range. ITO sputtering targets are suitable for the deposition of transparent conductive films for displays, touch interfaces, photovoltaic devices, optoelectronic components, sensors and advanced thin-film research.
Standard S4R targets are supplied as circular discs in 2-inch and 3-inch diameters with a nominal thickness of 3 mm. Alternative dimensions, thicknesses and bonded configurations are available upon request.
No account required. Add the products you need, then send your request to our technical sales team.
Request Pricing AccessAlready have an approved account? Sign in
Sputtering and Compatibility
Indium tin oxide is an electrically conductive oxide ceramic. DC magnetron sputtering is widely used for deposition from conductive ITO ceramic targets, while RF magnetron sputtering may also be used depending on the sputtering system and process requirements.
Actual deposition conditions depend on the sputtering-source design, applied power and power density, working pressure, process-gas composition, target-to-substrate distance, substrate material and temperature, target cooling and required film properties.
S4R does not specify universal sputtering power, working pressure, oxygen content, substrate temperature or deposition rate. These parameters must be established according to the sputtering system, target dimensions and required film characteristics.
The electrical resistivity, optical transmittance, carrier concentration, crystallinity and microstructure of deposited ITO films may vary with process conditions, oxygen partial pressure, substrate temperature and post-deposition treatment.
Because ceramic targets are brittle and may be sensitive to thermal gradients, appropriate cooling, uniform thermal contact and progressive power conditioning are recommended during operation.
Bonding services, backing plates, alternative thicknesses and custom target dimensions are available upon request.
Our latest content
Check out what's new in our company !