Zinc Sputtering Target (Zn)

The S4R Zinc Sputtering Target is manufactured from high-purity zinc metal for physical vapor deposition and magnetron sputtering applications.

Zinc is an electrically conductive metal characterized by a relatively low melting point, good atmospheric corrosion resistance and useful optical and electronic properties. It is widely used for the deposition of metallic, protective and functional thin films, as well as for reactive sputtering processes used to produce zinc oxide and related coatings in electronics, sensors, photovoltaics, optoelectronics and materials-science research.

The target is available in two standard laboratory formats with a nominal purity of 99.99% (4N):

• Ø50.8 × 3 mm
• Ø76.2 × 3 mm

Other dimensions, thicknesses, purity grades and backing-plate configurations may be available upon request.