Lithium Nickel Manganese Cobalt Oxide Sputtering Target (NMC811)
The S4R Lithium Nickel Manganese Cobalt Oxide Sputtering Target is manufactured from a multicomponent ceramic material with a nominal nickel, manganese and cobalt molar ratio of 8:1:1 for physical vapor deposition and magnetron sputtering applications.
The normalized composition is:
LiNi₀.₈Mn₀.₁Co₀.₁O₂
This composition is commonly designated NMC811, or NCM811 when cobalt is written before manganese. The designation “811” refers to the nominal transition-metal ratio:
Ni:Mn:Co = 8:1:1
NMC811 belongs to the family of nickel-rich layered lithium transition-metal oxides used as positive-electrode materials in lithium-ion battery research. Its relatively high nickel content is associated with high specific capacity and energy density, while also making composition control, surface stability and thermal processing particularly important.
NMC811 thin-film electrodes have been prepared experimentally by RF magnetron sputtering, including studies involving multilayer and compositionally graded electrode architectures. The composition and electrochemical properties of the deposited film nevertheless depend on the target composition, deposition conditions and any subsequent thermal treatment.
The standard S4R configuration is supplied as a 2-inch ceramic target indium-bonded to a 3 mm thick copper backing plate:
- Target diameter: Ø50.8 mm (2 in.)
- NMC811 target thickness: 3.18 mm (0.125 in.)
- Copper backing plate thickness: 3 mm
- Total nominal assembly thickness: approximately 6.18 mm, excluding the bonding layer
- Standard bonding method: indium bonding
- Ni:Mn:Co molar ratio: 8:1:1
- Purity: to be confirmed according to the product specification and batch certificate
Alternative dimensions, backing-plate configurations, bonding methods and unbonded targets may be available upon request. Final compatibility must be confirmed according to the customer’s sputtering cathode and mounting system.
The standard product corresponds to the nominal NMC811 composition. Lithium-enriched, lithium-deficient, doped, coated, gradient-composition or otherwise modified materials must be identified separately and should not be presented as equivalent to standard NMC811.
Already have an approved account? Sign in
Sputtering and Compatibility
NMC811 is a multicomponent ceramic oxide. RF magnetron sputtering is therefore the prudent standard recommendation for this bonded target configuration. RF magnetron sputtering has been used to produce NMC811 thin-film electrodes, but the resulting composition, microstructure and electrochemical properties depend on the deposition architecture and process conditions.
The copper backing plate provides mechanical support and promotes heat transfer between the ceramic target and the cooled sputtering cathode. The indium bonding layer improves thermal contact while accommodating part of the thermal-expansion difference between the ceramic target and the metallic support.
Actual deposition conditions depend on:
- sputtering-source design;
- RF generator and matching network;
- target density, porosity and microstructure;
- chemical homogeneity and lithium content;
- bonding quality and cathode cooling;
- sputtering-gas composition and pressure;
- substrate material and temperature;
- required film stoichiometry and crystallinity;
- post-deposition thermal treatment.
S4R should not specify a universal RF power, gas pressure, substrate temperature or annealing condition. These parameters must be developed according to the customer’s equipment and required film properties.
The deposited film should not automatically be assumed to reproduce the bulk target composition exactly. Lithium-containing multicomponent oxides may undergo preferential sputtering, lithium loss or other composition changes during deposition and subsequent thermal treatment. NMC811 materials can also exhibit surface instability and structural degradation, so the final film composition and phase should be verified experimentally.
Our latest content
Check out what's new in our company !