Lithium Nickel Manganese Cobalt Oxide Sputtering Target (NMC111)
The S4R Lithium Nickel Manganese Cobalt Oxide Sputtering Target is manufactured from a ceramic material with an equal nickel, manganese and cobalt ratio for physical vapor deposition and magnetron sputtering applications.
The supplier designation LiNiCoMnO₂ (1:1:1) corresponds to the normalized composition:
LiNi₁/₃Mn₁/₃Co₁/₃O₂
This composition is commonly designated NMC111, also written NCM111 or NMC333. It is a layered lithium transition-metal oxide used as a positive-electrode material in lithium-ion battery research. The ideal material has a layered α-NaFeO₂-type structure in which lithium and transition-metal ions occupy alternating layers.
In thin-film form, NMC111 is relevant to lithium-ion microbattery research, solid-state battery development, cathode–electrolyte interface studies and electrochemical thin-film characterization. RF sputtering has been reported for the preparation and study of NMC111-based thin films, but the composition and structure of the deposited film depend on the complete deposition and thermal-treatment conditions.
The standard S4R configuration is supplied as a 2-inch ceramic target indium-bonded to a 3 mm thick copper backing plate:
- Target diameter: Ø50.8 mm (2 in.)
- NMC111 target thickness: 3.18 mm (0.125 in.)
- Copper backing plate thickness: 3 mm
- Total nominal assembly thickness: approximately 6.18 mm, excluding the bonding layer
- Standard bonding method: indium bonding
- Ni:Mn:Co molar ratio: 1:1:1
- Purity: to be confirmed according to the product specification and batch certificate
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Alternative dimensions, backing-plate configurations, bonding methods and unbonded targets may be available upon request. Final compatibility must be confirmed according to the customer’s sputtering cathode and mounting system.
The standard product corresponds to the nominal NMC111 composition. Lithium-enriched, lithium-deficient, doped or otherwise modified compositions must be identified separately and should not be treated as equivalent to stoichiometric NMC111.
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Sputtering and Compatibility
NMC111 is a multicomponent ceramic oxide. RF magnetron sputtering is therefore the prudent standard recommendation for this product configuration. Published work demonstrates that NMC111 thin films can be prepared by RF sputtering, but film morphology, electronic properties and electrochemical behavior are influenced by the deposition and thermal-treatment conditions.
The copper backing plate provides mechanical support and promotes heat transfer between the ceramic target and the cooled sputtering cathode. The indium bonding layer provides thermal contact while accommodating part of the difference in thermal expansion between the ceramic target and the metallic backing plate.
Actual deposition conditions depend on:
- sputtering-source design;
- RF generator and matching network;
- target density and microstructure;
- target composition and homogeneity;
- lithium content;
- bonding quality and cathode cooling;
- sputtering gas and pressure;
- substrate material and temperature;
- desired film stoichiometry and crystallinity;
- post-deposition thermal treatment.
S4R should not specify a universal RF power, gas pressure, substrate temperature or annealing condition for NMC111. These parameters must be developed for the customer’s equipment and required film properties.
The composition of the deposited film should not be assumed to reproduce the bulk target exactly. Lithium-containing multicomponent materials may undergo preferential sputtering, lithium loss or composition changes during deposition and subsequent heat treatment. The final film composition and crystalline phase should therefore be verified experimentally.
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