Nickel Sputtering Target (Ni)

The S4R Nickel Sputtering Target is manufactured from high-purity nickel metal for physical vapor deposition and magnetron sputtering applications.

Nickel is a lustrous, silvery metallic element characterized by good mechanical strength, corrosion resistance and ferromagnetic behavior. It is widely used for the deposition of metallic, magnetic, conductive and functional thin films in research and laboratory environments.

The target is available in two standard laboratory formats with a nominal purity of 99.99% (4N):

Ø50.8 × 3 mm
Ø76.2 × 3 mm

Other dimensions, thicknesses, purity grades and backing-plate configurations may be available upon request.

Pricing available to approved customers

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Target Size
- Ø50.8 × 3 mm (2 in.)
- Ø76.2 × 3 mm (3 in.)

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Specification
Product Name	Nickel Sputtering Target
Material	Nickel
Chemical Symbol	Ni
CAS Number	7440-02-0
Purity	99.99% (4N)
Shape	Circular Disc
Standard Size 1	Ø50.8 × 3 mm
Standard Size 2	Ø76.2 × 3 mm
Imperial Equivalents	2 in. or 3 in. diameter
Quantity	1 Target
Appearance	Lustrous, Metallic, Silvery-Grey
Odor	Odorless
Atomic Number	28
Atomic Weight	58.6934 g/mol
Theoretical Density	Approximately 8.91 g/cm³
Melting Point	Approximately 1,453 °C
Thermal Conductivity	Approximately 91 W·m⁻¹·K⁻¹
Coefficient of Thermal Expansion	Approximately 13.4 × 10⁻⁶ K⁻¹
Magnetic Behavior	Ferromagnetic
Recommended Sputtering Mode	DC Magnetron Sputtering
Standard Configuration	Unbonded Solid Target
Bonding Options	Available Upon Request

Nickel Sputtering Target (Ni)

0.00 € 0.0 EUR 0.00 €

Pricing available to approved customers

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